溅射法制备金属薄膜及其特性研究

应用物理学论文编号:WLX121  字数:9164,页数:18

目  录
中文摘要 i
英文摘要 ii
目录 iii
第一章     绪论  1
1.1  薄膜背景介绍 1
1.2  薄膜制作工艺介绍 1
1.3  研究内容 2
第二章     溅射工艺技术  3
2.1   溅射原理与主要方式 3
2.2   工艺参数对薄膜性质的影响 4
2.3   溅射特性 5
第三章     薄膜制备及其特性研究 6
3.1   薄膜制备 6
3.2   膜的特性研究 6
   3.2.1前处理对附着性的影响 6
   3.2.2膜厚 7
   3.2.3方块电阻 9
   3.2.4金属膜台阶覆盖性 11
第四章     结论 13
致谢 14
参考文献 15

摘     要
 
 随着市场对各种新型功能薄膜需求的日益增加，溅射技术在科学研究和工业生产领域获得迅速发展。为了解溅射法制备金属薄膜的过程及其特性研究,采用直流二极溅射设备在玻璃基片上镀金膜，并对所获得的金属薄膜的厚度、电学性能、均匀性、重复性等进行实验测试。使用称重法，分析了溅射膜沉积量随时间的变化规律,采用扫描电子显微镜，光学显微镜对金属膜的形貌进行表征.分析薄膜的台阶覆盖性、平整性、附着性等相关性质。 结果表明：在其它相同条件下，溅射时间和膜厚大致上呈一定的线性关系，膜厚是随着工作时间的加长单纯地呈增长趋势，而且所制的膜均匀性并不是很好，呈中心高向四周下降的趋势，其中心也具有较好的台阶覆盖性。

关键词：溅射 镀膜 金属薄膜 特性

Abstract

    With the demands of new practice function about thin films in the market,sputtering technology have a great development in scientific research and industrial manufacture field , To investigate the   preparation of thin metal films by Sputtering method and its properties. The preparation of thin metal films on glass bases by DC dipole sputtering,and test the thin metal films of thickness,electrical properties, and uniformity,repeatability. The relationship between the thickness of sputtered films and working time were analyzed using weighing method; The morphology of metal films was studied using scanning electron microscopy and Optical microscope ,analysed the thin metal films'properties, step coverage, smoothness, adhesiveness.
    The results show that on the same conditions, thickness of sputtered films and Sputtering time present the linear relationship ,Thickness of sputtered films increase simply with the increasing of  Sputtering time.Sputtered films have features that Center high around to decline and better Step coverage.

Keywords：Sputtering  Preparation of thin films  Metal film  Properties